Abstract
MgO thin films as a protective layer in plasma display panels (PDPs) were deposited by an advanced ion-plating (IP) method. Scanning electron microscopy and atomic force microscopy observations revealed that the IP films had columnar structures with sharp apexes at the film surface. The MgO thin films were mainly (111) oriented, and the orientation of the films was strongly dependent on oxygen content in the deposition process. The growth of (111) orientated films was promoted in IP method compared to conventional electron beam deposition (EB) method. The performance of MgO protective film could be expected to improve by the advanced ion-plating (IP) method for PDPs application.
