Abstract
This paper is concerned with the relationships between the morphology of carbon films and the intensity of emission spectra in ECR plasma CVD of the system CH4-H2. A sample holder was connected in series to DC bias and it was negative to the apparatus. The application of negative bias caused an abrupt increase in emission intensity at about -100V bias. At the same time, smooth and flat carbon films were formed. The abrupt increase in emission spectra intensity was caused by the cooperative effects between DC and ECR powers. The formation of flat and smooth surface was attributed to the abrupt increase in plasma density which gives high speed ions, molecules and electrons. They might prevent the formation of secondary particles through aggregation of primary particles and/or enhance the peening effect on the substrate.
