Abstract
Terbium (III) ion-doped zirconia (ZrO2:Tb3+) thin films have been directly prepared on soda-lime glass and Si wafer by the liquid phase deposition (LPD) method. The stabilization of Tb3+ ion in the LPD reaction solution, containing fluoride anions, was successfully achieved by using DTPA (diethylenetriaminepentaacetic acid) as a masking reagent. Preparation composition of ZrO2:Tb3+ thin film was determined by inductively coupled plasma-atomic emission (ICP-AES) microscopy analysis. The structural and luminescence properties for the deposited films were analyzed. After annealed at 900°C, the deposited film shows characteristic strong emission assigned to 5D4→7F5 of Tb3+ under CT band excitation.