Abstract
The cathodic electrodeposition of titania thin films from solutions containing a titanium salt was studied. Titanium tetrachloride was dissolved in an ethanol-water solution with hydrogen peroxide to prepare titanium peroxocomplex solutions. The deposition of the titania precursor on platinum-coated silicon wafer substrates was carried out by electrolysis of the solutions under constant current conditions. The deposits were thermally treated at fixed temperatures in air and then characterized by X-ray diffraction and scanning electron microscopy.