Continuous Deposition System of SnO₂ Thin Film by the Liquid Phase Deposition (LPD) Method

Abstract

SnO₂ thin film was prepared from a SnF₂-HF aqueous solution with the addition of H₃BO₃ aqueous solution by the Liquid Phase Deposition (LPD) method. We focused on the construction of the continuous deposition system and the control of the deposition rate. Parent solution containing SnF₂-HF was intermittently added to the treatment solution, which consists of the excess amount of H₃BO₃. As a result, the deposition rate can be maintained almost constant, at least for 24 h, and uniform SnO₂ film with the thickness of more than 600 nm was obtained.