Journal of the Ceramic Society of Japan
Online ISSN : 1348-6535
Print ISSN : 1882-0743
ISSN-L : 1348-6535
Feature: Science and Technology for Advanced Sustainable Ceramics: Papers
Apparent high mobility ~30 cm2/Vs of amorphous In–Ga–Zn–O thin-film transistor and its origin
Zewen XIAOKay DOMENToshio KAMIYAHideo HOSONO
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2013 Volume 121 Issue 1411 Pages 295-298

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Abstract
Amorphous In–Ga–Zn–O (a-IGZO) thin-film transistors (TFTs) annealed in ozone at 250°C exhibited a good subthreshold swing (S) of 123 mV/decade and a saturation mobility (μsat) of ~10 cm2/Vs, but a bit large threshold voltage (Vth) of 11.6 V. Further oxygen annealing at 200°C resulted in high apparent μsat of ~30 cm2/Vs and deteriorated characteristics such as a large S value and large hysteresis. The high apparent μsat values were attributed to the electrical discharge between the gate and source electrodes. Reasonably actual μsat values ~10 cm2/Vs were obtained using the actual capacitance calculated from the discharge characteristics.
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© 2013 The Ceramic Society of Japan
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