Fabrication of WO3 Thin Film by Sol-Gel Dip-Coating Method

Chang-Yeoul Kim; Byung-Seop Kim; Jin-Wook Choi; Duck-Kyun Choi; Tae-Young Lim

doi:10.14852/jcersjsuppl.112.0.S244.0

Journal of the Ceramic Society of Japan, Supplement 112-1, PacRim5 Special Issue

Session ID : 3

DOI https://doi.org/10.14852/jcersjsuppl.112.0.S244.0

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Host: The Ceramic Society of Japan

Co-host: Iketani Science and Technology Foundation, International Ceramic Federation, Commemorative Organization for the Japan World Exposition '70, The American Ceramic Society, The Australasian Ceramic Society, The Chinese Ceramic Society, The Korean Ceramic Society, Joint Research Consortium of Synergy Ceramics/Fine Ceramics Research Association, Nanotechnology Researchers Network Center of Japan, The Special Coordination Funds for Promoting Science and Technology, Japan National Tourist Organization, Aichi Prefectural Government, CASIO SCIENCE PROMOTION FOUNDATION, DAIKO FOUNDATION, Nagoya Convention and Visitors Bureau, The Asahi Glass Foundation, The Kao Foundation For Arts And Sciences, The Murata Science Foundation, The Ogasawara Foundation for the Promotion of Science & Engineering, ASAHI GLASS CO., LTD. Research Center, CENTRAL GLASS CO., LTD., ELECTRIC GLASS INDUSTRY ASSOCIATION OF JAPAN (EGAJ), Hattori Company, Ltd., Hitachi Research Laboratory, Hitachi, Ltd., HOYA CORPORATION, INAX Corporation, ITOCHU CERATECH CORP., Japan Cement Association, KYOCERA Corporation, KYUSHU REFRACTORIES CO., LTD., MINO CERAMIC CO., LTD., Murata Manufacturing Co., Ltd., NGK INSULATORS LTD., NGK SPARK PLUG CO., LTD., NICHIAS Corporation, NIKKO COMPANY, Nippon Electric Glass Co., Ltd., Nippon Sheet Glass Co., Ltd., NORITAKE CO., LIMITED, Tokuyama Corporation, TOTO LTD.

Papers

Fabrication of WO₃ Thin Film by Sol-Gel Dip-Coating Method

Chang-Yeoul Kim, Byung-Seop Kim, Jin-Wook Choi, Duck-Kyun Choi, Tae-Young Lim

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Keywords: Electrochromic, Sol gel, FT-IR, DTA/TG, Electrochemical, Amorphous

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Abstract

Electrochromic WO₃ thin film was prepared by using tungsten metal solution in hydrogen peroxide as a starting solution and by sol-gel dip coating method. The chemical modification was analyzed by FT-IR spectroscopy and the thermal analysis was conducted by DTA/TG method. DTA/TG analysis and XRD pattern showed that tungsten oxide crystal phase formed at 400°C. SEM microstructure also showed that about 20 nm sized crystals appeared in amorphous matrix at 400°C. In the view of electrochemical property, WO₃ thin film which was heat-treated at 300°C and was amorphous had better than that of the crystalline phase.

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