Fabrication of (Bi,Pb)2223 Films by a DC Magnetron Sputtering Method

Abstract

We fabricated Bi₂Sr₂Ca₂Cu₃O₁₀ (Bi2223) thin films on SrTiO₃ (100) substrates using a DC magnetron sputtering method. From X-ray diffraction measurements (θ-2θ and φ-scan), the as-grown film had a Bi2223 single phase and a biaxial crystal orientation. The critical temperature of the as-grown films was 72 K. For improving the crystallinity and inserting Pb into the films, the as-grown Bi2223 films were post-annealed at 840-866°C for 30 hours. The optimum post-annealing temperature was found to be around 848°C. The critical temperatures of the (Bi,Pb)2223 films post-annealed over 848°C exceeded 100 K and the critical current density of the film post-annealed at 848°C was 2.2 × 10⁵ A/cm² at 77 K in a self-field.