Journal of High Temperature Society
Print ISSN : 0387-1096
Research Paper
Development of Ceramic Coatings for Electrostatic Adsorption Force using Atmospheric Plasma Spraying
Jun-ichi TAKEUCHIRyo YAMASAKIKazumi TANI
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2008 Volume 34 Issue 6 Pages 287-292

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Abstract
In state-of-the art semiconductor equipment such as dry etchers, CVD and PVD chambers as well as in the liquid crystal manufacturing industry, it is very important to consistently keep silicon wafers or glass on the susceptor. The main objectives are to improve the accuracy of both positioning and temperature control.
Generally electrostatic adsorption force is used for holding silicon wafers or glass inside of a treatment chamber. The sintered ceramics, the polymer resin, and the thermal sprayed ceramic coatings are used as the dielectric substance to isolate and protect the surface of the electrostatic chuck and limit contamination and particle generation. However, investigations of the electrostatic adsorption force through thermal sprayed ceramic coatings have been limited. In this study, a ceramic coating having the electrostatic adsorption force was developed and its basic mechanical and electrical characteristics were investigated, and compared with those of sintered ceramics.
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© 2008 by High Temperature Society of Japan
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