JOURNAL OF THE ILLUMINATING ENGINEERING INSTITUTE OF JAPAN
Online ISSN : 1349-838X
Print ISSN : 0019-2341
ISSN-L : 0019-2341
Study on UV/O3 Cleaning by Xe2*Excimer Lamp
Shinichi Iso, Tatsushi Igarashi, Hiromitsu Matsuno
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Keywords: Xe2* excimer lamp, UV/O3 cleaning, cleaning speed, 172nm, contact angle, excited atomic oxygen
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1999 Volume 83 Issue 5 Pages 273-277

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Abstract
UV/O3 cleaning by an Xe2*excimer lamp was investigated under various experimental conditions. We found that UV/O3 cleaning was caused by excited atomic oxygen {O (1D)} and that the cleaning speed was about six times faster than that using a low-pressure Hg lamp.
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