Journal of the Japanese Association for Crystal Growth
Online ISSN : 2187-8366
Print ISSN : 0385-6275
ISSN-L : 0385-6275
MOCVD Growth of III-V Compound Semiconductors on Si Substrates Using Strained Superlattice Intermediate Layers
Masayoshi UmenoTetsuo Soga
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1987 Volume 13 Issue 4 Pages 248-252

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Abstract
GaAs is grown on Si substrate with strained superlattice intermediate layers. Defects, deep levels and stress of the grown GaAs layers on Si are characterized. The use of straind layer superlattices would be effective to obtain other III-V compound semiconductors on Si substrates.
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© 1987 The Japanese Association for Crystal Growth
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