Journal of the Japanese Association for Crystal Growth
Online ISSN : 2187-8366
Print ISSN : 0385-6275
ISSN-L : 0385-6275
24aB1 Oxygen transport mechanism in Si melt under transverse magnetic fields
Koichi KAKIMOTOHiroyuki OZOE
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1999 Volume 26 Issue 2 Pages 135-

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Abstract
Transport mechanism of oxygen in silicon melt under transverse magnetic fields was clarified using three-dimensional and time-dependent calculation. The calculation clarified the following results. 1) Oxygen in grown crystals is dissociated from side wall of a crucible. 2) Oxygen which was dissolved from side wall of a crucible is transferred parallel to magnetic fields. 3) Oxygen is incorporated from a region which settled parallel to magnetic fields to solid-liquid interface.
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© 1999 The Japanese Association for Crystal Growth
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