Journal of the Japanese Association for Crystal Growth
Online ISSN : 2187-8366
Print ISSN : 0385-6275
ISSN-L : 0385-6275
A Strategy for Silicon Technology in the 21st Century : Silicon(<Special Issue>Bulk Crystals for Human Activity in the New Millennium)
Nobuyuki Akiyama
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2000 Volume 27 Issue 2 Pages 3-7

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Abstract

It is well recognized that high-speed and high-density silicon devices will be necessary for the ever-advancing information world in the 21 st century. However, it is not so clear, at this moment, what policy is required to enable the silicon industry to keep up with demands . This report discusses what subjects in silicon technology should be developed to meet the requirements in that age, emphasizing simulation technologies for the production of the high-quality silicon necessary for the advanced electronics industry. They will not only enable the production of top-quality wafers for various devices, but will also cut R & D costs and time. The strategy will require systematic simulation of fundamental research that has had a low level of activity until now. It should cover material properties at high temperature, such as the thermophysical properties of molten silicon. To solve the problem of human resources, scientists from various fields must be called together. R & D should be split among industry, government, and universities based on this strategy.

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© 2000 The Japanese Association for Crystal Growth
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