Journal of the Japanese Association for Crystal Growth
Online ISSN : 2187-8366
Print ISSN : 0385-6275
ISSN-L : 0385-6275
Research about lateral wet oxidation on AlAs layer of GaAS/AlAS hetero structure
Takafumi NakamuraTomo KikuchiJ.T. NelsonTadashi Ohachi
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2002 Volume 29 Issue 2 Pages 23-

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Abstract
We found that the lateral oxidation of GaAS/AlAS hetero structures with a Be-doped GaAs layer depended on the amount of Be doping. Be doping increased the oxidation rate over that of undoped layers, and the rate increased with an increase of Be doping. Qualitatively, the results indicated that oxygen ions transport through the through oxidation layer and electrons transport through the GaAs layer.
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© 2002 The Japanese Association for Crystal Growth
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