Journal of the Japanese Association for Crystal Growth
Online ISSN : 2187-8366
Print ISSN : 0385-6275
ISSN-L : 0385-6275
26aE06 Growth of Flower-like InN by means of Halide CVD under Atmospheric Pressure(NCCG-34)
[in Japanese]
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2004 Volume 31 Issue 3 Pages 248-

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Abstract
Preparation of indium nitride has been examined by means of an atmospheric pressure halide chemical vapor deposition technique utilizing a reaction of gaseous InCl_3 and NH_3. From the SEM observations of the crystals deposited onto a Si(100) substrate it was found that they showed flower-like structure, and that each of the flowers has six petals and a style at 823K. It has high symmetry, and possesses a six-fold axis along the style. It was amazing that the crystals constituting a flower have lovely geometry of staggered hexagonal bi-pyramid.
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© 2004 The Japanese Association for Crystal Growth
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