Journal of the Japanese Association for Crystal Growth
Online ISSN : 2187-8366
Print ISSN : 0385-6275
ISSN-L : 0385-6275
01aA05 Dynamic analysis of temperature distribution in multi-crystalline silicon of a casting method with moving heater system(NCCG-36)
Satoshi NakanoLijun LiuKoichi Kakimoto
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2006 Volume 33 Issue 4 Pages 181-

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Abstract
2D-axisymmetric global simulation was carried out to analyze temperature and velocity fields during silicon crystal growth. Configuration of heaters were changed to clarify the effects of the height and the position of the heaters on temperature distribution. We used a system with 3 heaters; heaterl and 2, heaterl and 3, heater2 and 3. Total heater power was distributed the heaters. Distribution of power in the heaters was modified to study how such distribution modifies the temperature distribution. We studied the effect of input heater power distribution and position of heaterl and 2 on the melt-solid interface shape, the thermal field and convection of melt in the crucible.
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© 2006 The Japanese Association for Crystal Growth
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