Journal of the Japanese Association for Crystal Growth
Online ISSN : 2187-8366
Print ISSN : 0385-6275
ISSN-L : 0385-6275
Current Advances in SiC Solution Growth(<Special Issue>)Opening Up a New World of Crystal Growth on SiC)
Shunta HaradaYuji YamamotoKazuaki SekiToru Ujihara
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2013 Volume 40 Issue 1 Pages 25-32

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Abstract
Solution growth has a potential to achieve high quality bulk SiC growth. In this paper we review current advances in SiC solution growth specially focusing on the crystal quality. During the solution growth, threading dislocations tend to be converted to basal plane defects by the step-flow of macrosteps. This phenomenon implies that all dislocations can be excluded from the lateral face of the crystal in principle. Actually, high quality SiC crystal with very low threading dislocation density was obtained applying the dislocation conversion during the solution growth.
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© 2013 The Japanese Association for Crystal Growth
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