Bilayer Thickness Dependence on Self-Propagating Exothermic Reaction of Al/Ni Multilayer Films

Abstract

　　　In this study, we investigate a crystal structure change in the exothermic reaction process of Al/Ni films and the bilayer thickness effect by using the BL46XU in the SPring-8. Sputtered Al/Ni multilayer films with the bilayer thickness ranging from 8nm to 100nm are subjected to time-resolved X-ray diffraction analysis. All the films are ignited by electrical shock. No bilayer thickness effect on crystal structure after the reaction is shown, whereas crystal structure before the reaction is dependent on bilayer thickness. As the result, it is thought that the mixing layer influences the propagating exothermic reaction properties of the Al/Ni multilayer films.