Fabrication of 3D Nano-Periodic Structure Using Multiple Exposure Lithography by Talbot Effect

Abstract

Recently, structures having periods of nanometer scale, such as photonic crystals and biomimetic structures, have been developed. And, it is known that the optical function becomes diversified as the period of the structure becomes multidimensional. So, a highly efficient fabrication method of three dimensional nano periodic structure is required. The Talbot effect is a phenomenon in which a periodic light intensity distribution is generated by a diffraction grating and has high processing efficiency by applying it to lithography. However, there is a problem that flexibility of processing is low. To solve this problem, we propose to use multiple exposure for lithography using Talbot effect. In this paper, the structure is three - dimensionalized by rotating the diffraction grating and performing multiple exposure, and the flexibility of lithography processing using the Talbot effect is improved.