Study on Polishing of Semiconductor Crystals (3)

Worked layers of optically polished surfaces in view of the ultra microscratching hardness (I)

Abstract

In order to investigate the worked layers of polished semiconductor crystals, the ultra microscratching hardness tester has been made in trial, the load of which is given in the range from 10 to 5, 000 mg. By the use of a very sharp diamond triangular pyramid, plastic flow can easily be realized on crystal surfaces, and the widths of scratches are measured by an electron microscope. The relation between the scratching load and the deformation is clarified on optically polished germanium.