Abstract
By the use of the trially made ultra-micro scratching hardness tester, the relation 'between the scratching loads and the deformations has been clarified on the optically polished silicon. Hardness numbers having been obtained, along the depths from the polished surfaces of germanium and silicon the worked layers are discussed in view of the hardness variations. The results obtained are as follows:
(1) The work softening exists in silicon to a depth of 700 Å, while the indication of softening is seen in germanium at a depth of less than 200 Å.
(2) The constant hardness numbers are shown at a depth of 10, 000-15, 000 A for both crystals, which is very close to that obtained from the etching rate curves.
(3) The softening phenomenon is caused by the temperature rises due to surface friction. According to the simplified model, the temperatures reach near the softening points for both crystals.
