Journal of the Japan Society for Precision Engineering
Online ISSN : 1882-675X
Print ISSN : 0912-0289
ISSN-L : 0912-0289
Mechano-Electrochemical Polishing of Ferrite
Improvement of Removal Rate with Applied Voltage
Toshio TAMURANoriyoshi ARAKAWAYuuji OCHIAI
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1988 Volume 54 Issue 12 Pages 2307-2312

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Abstract

This paper presents some experimental results on mechano-electrochemical polishing with applied voltage and suggestion on the mechanism of this polishing. In polishing of ferrite with stannum plate and diamond-slurry-mixed hydrochloric acid to build up the inner cell, electrochemical action adds to mechanical action. This electrochemical action is accelerated by applied voltage between stannum plate and ferrite. In this case, stock removal rate of ferrite is increased to four times that without applied voltage or to tweentieth times that of mechanical polishing. Morever, surface damaged layer of ferrite is reduced to one tenth that of mechanical polishing.

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