Ultra Clean Technology and In-process Monitoring in Semiconductor Microfabrication
Keywords:
in-process monitoring,
ultra clean technology,
energy clean technology,
low kinetic energy particle process,
wafer temperature monitoring,
process gas pressure monitoring,
process gas flow monitoring,
process gas purity monitoring,
high speed spectrometer,
high sensitivity and high speed monitoring
1988 Volume 54 Issue 4 Pages 627-632
Details
Article 1st page
