Laser-Induced Thermo-Chemical Etching of Ceramics

Etching Characteristics in CF₄ Gas

Abstract

CO₂ laser was used to induce localized thermo-chemical etching of ZrO₂, Al₂O₃ and Si₃N₄ in CF₄gas, and the etching characteristics were investigated. The etching rate obtained in CF₄ gas was several times greater than the one obtained in air. The etched hole was not accompained by surface cracks and melted materials, and the crystal grain was observed on the etched surface.