Journal of the Japan Society for Precision Engineering
Online ISSN : 1882-675X
Print ISSN : 0912-0289
ISSN-L : 0912-0289
Deposition of Cubic Boron Nitride Film by Laser PVD with Simultaneous N Ion Supply
Shin-ei MINETANobuo YASUNAGAMamoru KOHATAYoshikazu KIKUTA
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1990 Volume 56 Issue 10 Pages 1894-1899

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Abstract
The cubic boron nitride films have been prepared by newly developed CO2 laser PVD process assisted with simultaneous irradiation of nitrogen ion accelerated by a Kaufman type ion source. The CO2 laser beam was focused and irradiated onto the peripheral surface of a rotating sintered hexagonal boron nitride (hBN) ring and the vapor was deposited on a substrate. The films were characterized by ESCA, thin film X-ray Diffraction, AES, IR spectroscopy and SEM. The composition ratio N/B of the prepared film has neared 1 at an accelerating voltage over 1 kV. Cubic boron nitride was clearly indentified at nitrogen ion accelerating voltage over 0.5 kV. The cBN rich films were found to have extremely high Knoop hardness of 3 800-4 600 kgf/ mm2 and high wear-resistance against Ni-Mo steel.
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