Abstract
In order to enlarge the diamond deposition area by arc discharge plasma CVD method, a new type of arc discharge plasma jet CVD apparatus has been developed. This apparatus has one cathode torch and three anode torches. The cathode torch is arranged perpendicularly to each of three anode torches that are arranged in axial symmetry. These torches can be moved along their own axes, so that the discharge area where the plasma jet generates can be changed. As a result, the diameter of the plasma jet has been increased by changing of the arrangement of the plasma torches and the diamond deposition area has been enlarged to 42mm diameter with the expansion of the area that the plasma jet sprays on.
