Journal of the Japan Society for Precision Engineering
Online ISSN : 1882-675X
Print ISSN : 0912-0289
ISSN-L : 0912-0289
Radical Measurements in Plasmas for Semiconductor Processing using Laser Spectrosco, oic Technicues
Toshio GOTO
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Keywords: radical, SiH3, CF3, CH3, laser spectroscoDy, infrared diode laser absorption spectroscobv, laser induced fluorescence snectroscocy, plasma process, CVD, etching
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1994 Volume 60 Issue 11 Pages 1549-1553

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