Guideline for Efficient and Precise Anisotropic Etching Conditions

Abstract

Anisotropic etching process is expected as one of the micro-machining processes and some studies have been made with respect to its chemical reaction and finished accuracy, however, because of being affected by many complicated parameters associated with material, etchant, etc., its favorable condition so as to maximize both the finishing accuracy and etching efficiency is not yet established. The present paper has proposed a guideline for selecting this favorable etching conditions and summarized the result in a form of flowchart.