Journal of the Japan Society for Precision Engineering
Online ISSN : 1882-675X
Print ISSN : 0912-0289
ISSN-L : 0912-0289
Present Status of Post CMP Cleaning and Future Prospects
Masahisa MATSUNAGA
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Keywords: post CMP cleaning, contamination after CMP, planarization, RCA cleaning, wet cleaning, mechanical cleaning, research committee, future prospect, electrolytic ionized water, little disolved oxygen water
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1996 Volume 62 Issue 4 Pages 501-506

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