Abstract
The deposition of diamond films by conventional arc discharge plasma jet CVD is limited to control in terms of dimensions and quality. An arc discharge plasma jet CVD apparatus that utilizes a plasma jet regulated its properties by a magnetic field has been designed and developed in order to synthesize homogeneous diamond films in thickness and quality. As a result of the assistance of a magnetic field, the diameter of a plasma jet increases and the distribution of substrate temperature is improved, and uniformity of thickness, grain size and orientation of crystal faces of diamond films occurs when the magnetic flux density of above 1.6 × 10 -2 T is applied.
