Abstract
This paper describes the geometrical surface modification of a synthetic silica glass. Varying the incident angle, the fluence and the number of pulses, ArF excimer laser beam was irradiated on to a synthetic silica glass. As the incident angle increased, striae parallel to the radiation direction appeared. Particularly when the angle was larger than 80°, the striae lined up in the direction of radiation. However when the angle larger than 83°, no striae could be found on the surface. As the results, incident angle extremely effects the lining up. Threshold fluence to form striae was 4J/cm2. From the observation by AFM, the length, the depth and the width of a stria were 15mm, 130nm, 1.5mm, respectively. Moreover to examine the formation mechanism soda-lime glass, quartz, corundum and calcium fluoride were chosen from the viewpoint of crystal structure or low absorption ratio of 193nm light, and they were irradiated on the same way. Only on the quartz similar striae appeared. These results draw the conclusion that the low absorptkon ratio and SiO2 composition easily form fine striae.
