Abstract
Yttria films were prepared by laser CVD using an Y(dpm)3 precursor. When the laser power (PL) was less than 100 W, deposition rates were small around 10 μm/h comparable to those by conventional thermal CVD. At PL>160 W, deposition rates increased drastically to more than 200 μm/h. The highest deposition rate in this study was 270 μm/h, which is 100 times higher than that reported in literatures. Film morphologies changed from a dense isotropic structure to a (440) oriented columnar structure with increasing substrate pre-heating temperature. By changing PL during deposition, a structure-graded yttria film was obtained. Moreover, Periodically structure-graded yttria films were also prepared by periodical changing of PL.
