パルスレーザー堆積法により作製したCr(N, O)薄膜の組織観察

井上 淳; 浅見 廣樹; 鈴木 常生; 中島 清美; 木本 浩司; 松井 良夫; 中山 忠親; 末松 久幸; 江 偉華; 新原 晧一

doi:10.2497/jjspm.54.194

Paper

Morphology Observation of Cr(N, O) Thin Films Prepared by Pulsed Laser Deposition

Jun Inoue, Hiroki Asami, Tsuneo Suzuki, Kiyomi Nakajima, Koji Kimoto, Yoshio Matsui, Tadachika Nakayama, Hisayuki Suematsu, Weihua Jiang, Koichi Niihara

Author information

Jun Inoue
Extreme Energy-Density Research Institute, Nagaoka University of Technology
Hiroki Asami
Extreme Energy-Density Research Institute, Nagaoka University of Technology
Tsuneo Suzuki
Extreme Energy-Density Research Institute, Nagaoka University of Technology
Kiyomi Nakajima
National Institute for Materials Science
Koji Kimoto
National Institute for Materials Science
Yoshio Matsui
National Institute for Materials Science
Tadachika Nakayama
Extreme Energy-Density Research Institute, Nagaoka University of Technology
Hisayuki Suematsu
Extreme Energy-Density Research Institute, Nagaoka University of Technology
Weihua Jiang
Extreme Energy-Density Research Institute, Nagaoka University of Technology
Koichi Niihara
Extreme Energy-Density Research Institute, Nagaoka University of Technology

Keywords: chromium oxynitride, thin film, hardness, morphology, pulsed laser deposition

JOURNAL OPEN ACCESS

2007 Volume 54 Issue 3 Pages 194-197

DOI https://doi.org/10.2497/jjspm.54.194

Details

Abstract

Chromium oxyniride (Cr(N, O)) thin films have been successfully prepared by using pulsed laser deposition (PLD). Oxygen content in the thin films (x) was controlled by changing experimental conditions, and x of each thin film was determined to be 8, 14, 28 and 30 at.% by using Rutherford backscattering spectroscopy. The hardness of thin films was measured by Vickers hardness tester. The hardness of Cr(N, O) thin films increased with increasing x. Furthermore, morphology observation by the result of transmission electron microscope, the marked grain refinement was not observed by addition of oxygen to CrN.

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