Optimizing Imprinting Condition for High Aspect Grating of Pd-based Metallic Glass

Abstract

X-ray phase contrast imaging with an X-ray Talbot interferometer has attracted attention because it exhibits high sensitivity for materials consisting of light elements with weak X-ray absorption. In order to improve the sensitivity of X-ray Talbot interferometer, the development of amplitude grating (G2) with a high aspect ratio is necessary. Conventionally, such gratings are fabricated by electroplating of Au. However, this technique suffers from its high cost and is time consuming to obtain large-area uniform pattern. Recently, Yashiro et al. have developed an innovative method to fabricate high aspect ratio gratings in low cost. They applied imprinting method using viscous flow of Pd_42.5Ni_7.5Cu₃₀P₂₀ metallic glass and successfully fabricated grating G2 with aspect ratio of 2.5. Furthermore, they also demonstrated that the grating can be used for X-ray phase contrast imaging with an X-ray Talbot interferometer. In the present study, we intend to optimize the imprinting conditions of Pd-based metallic glass to achieve higher aspect ratio, and metallic glass with maximum filling depth was estimated by resistance heating.