Abstract
The sputtering was applied to the vapor source of the gas evaporation technique which is one of physical techniques to produce ultrafine particles. Two kinds of sputtering techniques were tried; one is sputtering with an aid of a thermal electron and the other is the ordinary one with two parallel electrode plates. W, and Ag and Cu are chosen as a test sample. Particles of W, and Ag and Cu are formed by the former and the latter, respectively. Reactive sputtering results in the formation of WC1-x particles.
