Abstract
Thin films were formed by simultaneous depositions from two AF-sputter sources which were mounted so that the incident angles of the sputtered particles were +70° and -70° from the substrate normal. A microstructure of ZnTe/SiO2 thin film were examined by TEM. The ZnTe/SiO2 thin film was an anisotropic nm-scale composite whose microstructure was similar to that of the film computer-generated with the simulated deposition conditions. A Cu/SiO2 thin film was also inferred to have an anisotrop ic microstructure through the observation of the polarization of the transmitted light. Simultaneous oblique depositions from two sources will be a promising method to generate unique sans composites.
