Journal of the Japan Society of Powder and Powder Metallurgy
Online ISSN : 1880-9014
Print ISSN : 0532-8799
ISSN-L : 0532-8799
Preparation of Y-Ba-Cu-O Superconducting Films on Si Substrates by Chemical Vapor Deposition
Hisanori YamaneYoshiki AmamotoToshio HiraiHideyuki KurosawaTsutomu YamashitaHiroaki MyoreYukio Osaka
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JOURNAL OPEN ACCESS

1992 Volume 39 Issue 9 Pages 740-743

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Abstract
Y-Ba-Cu-O films were prepared at 700°C on Si(100) substrates and on (Y2O3)/(Y2O3 stabilized ZrO2) buffer layers by chemical vapor deposition using p-diketone metal chelates as sources. The films were mainly composed of c-axis oriented YBa2Cu3Ox. Auger electron spectroscopy revealed interdiffusion of elements between the substrates and the films deposited directly on the Si substrates. The interdiffusion was prevented using the buffer layers. Epitaxial growth of YBa2Cu3Ox was confiremed by X-ray pole figure analysis for the films deposited on the Si substrates with the buffer layers. The films on the buffer layers showed zero resistivity at 87 K. Its critical current density was 103A/cm2 at 77 K and 0 T.
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