Abstract
The characteristics such as growth rate, microstructure and quality of Al2O3 film coated on WC-βt-Co cemented carbide (having TiC and TiN thin films) were investigated as a function of H2S content in CVD atmosphere. It was found that the growth rate of Al2O3 film sharply increased; the columnar structure of the film was promoted; the sulphur content in Al2O3 film increased; the difference in film thickness between edge and flat of specimen decreased with increasing H2S content. It was noticed that the strength of Al2O3 film and adhesive strength between Al2O3 and TiN-TiC films would lower by using H2S contained atmosphere.
