Journal of the Japan Society of Powder and Powder Metallurgy
Online ISSN : 1880-9014
Print ISSN : 0532-8799
ISSN-L : 0532-8799
Crystallographic and Magnetic Characteristics of Co-Zn Ferrite Films Deposited by Plasma-free Sputtering Method
Kenji NomaNobuhiro MatsushitaShigeki NakagawaMasahiko Naoe
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1996 Volume 43 Issue 1 Pages 46-51

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Abstract

Co-Zn ferrite films were expected for high density magnetic recording media and magnetic thin film devices because of its large magnetocrystalline anisotropy energy and high coercivity. Facing Targets Sputtering (FTS) method was used to deposit Co-Zn ferrite films and the films composed of well (111) oriented crystallites were attained at the substrate temperature T2 below 100°C by using sintered targets with the composition of Co0.51Zn0.45Fe2.04Oy The maximum value of saturation magnetization 4πMs of 4.8 kG was attained at Ts of 250°C and the in-plane and perpendicular coercivities, Hc// and Hc⊥ were around 1.8 kOe, respectively. It was also found that the preferred orientation of Co-Zn ferrite crystallites were strongly dependent on Ts.

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