Journal of the Japan Society of Powder and Powder Metallurgy
Online ISSN : 1880-9014
Print ISSN : 0532-8799
ISSN-L : 0532-8799
Synthesis of Oxide Fine Particles Induced by Ion Implantation into Glass and Sapphire
Masami IkeyamaSetsuo NakaoSoji MiyagawaYoshiko MiyagawaHiroaki NiwaSeita TanemuraKazuo Saitoh
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1998 Volume 45 Issue 12 Pages 1216-1219

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Abstract

Using double ion species implantation of metal and oxygen ions, we have examined the possibility of synthesis of metal-oxide fine particles in glass or sapphire surface. Characteristics of ion implanted silica glass and sapphire were examined by RBS, XRD and optical (absorption and photo-luminescence) measurements. 1.8 MeV 1×1017 Cu+/cm2 implantation into silica glass and a successive heat treatment of 1000°, 1h in the air can make Cu fine particles. 1.8 MeV 1×1017 Cu+/cm2 and 1.0 MeV 1×1017 O+/cm2 implantation into silica glass and the successive heat treatment can synthesis Cu2O fine particles of about 8 nm in radius. 1.8 MeV 5×1016 Ti+/cm2 and 1.0 MeV 1×1017 O+/cm2 into sapphire and the successive heat treatment can synthesis Ti02 fine particles of about 10 nm in radius. The TiO2 particles were rutile-type with (200) orientation, which may be related to the (0001) orientation of sapphire substrate. Luminescence from defects in sapphire substrate was observed, but luminescence from the particles could not be detected.

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