Deposition Rate of Magnetite Films Synthesized by Ferrite Plating at Room Temperature

Abstract

Magnetite (Fe₃O₄) films were successfully grown at 24°C from an aqueous solutions of FeC1₂ into which an oxidizing solution of (1) NaNO₂ + NH₃ (pH-adjuster) +CH₃COONH₄ (pH-buffer), (2) NaNO₂+NH₃+NH₄C1(pH-buffer), or (3) NaNO₂+NH₃, was added. Films of single phase Fe₃O₄, as revealed by X-ray diffractometry, were obtained at pH=8-9. The pH value is increased from pH=5-7 at which single phase Fe₃O₄ films were synthesized previously at 60°C, as predicted from theory. The deposition rates of the Fe₃O₄ films take maximum values of 2.3 nm/min., 11.4 nm/min., and 6.3 nm/min. when oxidizing solution of (1), (2) and (3) were used, respectively. The films grown using the oxidizing solution. (3) were smooth in surface but those grown using (1) and (2) had rough surfaces.