Tb-Fe Sputtered Films with Large Magnetostriction for Use in Magnetomechanical Thin-Film Devices

Abstract

We examined the magnetostriction and coercive force of amorphous Tb-Fe films while varying the sputtering conditions (rf input power, Ar gas pressure, Tb content, and so on). Here we discuss the possibility of obtaining both soft magnetic properties and large magnetostrictionin this system. Soft magnetic properties and large magnetostriction were obtained simultaneously in sputtered Tb-Fe thin films prepared with a composition of 45∼50 at% Tb-Fe. Ar gas pressure of 4 mTorr, and rf power of 200 W. This material has astrong potential for use in magnetomechanical thin-film devices.