Abstract
A study was made of the properties and structure of Co-Si-Pd-O based films, prepared by reactive sputtering method Soft magnetic properties are found in the films with O content at the percolation threshold, and realized in the composition range more than 2%Si and 5%Pd in Co- Si-Pd-(O) pseudo-ternary system films. A larger Hk than 200 Oe is attained in the soft magnetic films near 8%Si and more than 10%Pd, where ρ is about 1000 μΩcm. The compositional dependence of these properties except Hk can be explained by the structure change with composition. A large Hk can be easily controlled by magnetic annealing from 0 to more than 200 Oe, which originates in the induced magnetic anisotropy.
