Polysilicon Production in Mitsubishi Materials Corporation

Motomi TAKESHITA; Hideo ITO; Yasuhiro HANAUE

doi:10.2473/journalofmmij.123.704

Journal of MMIJ

Online ISSN : 1884-0450
Print ISSN : 1881-6118
ISSN-L : 1881-6118

Technical Report

Polysilicon Production in Mitsubishi Materials Corporation

Motomi TAKESHITA, Hideo ITO, Yasuhiro HANAUE

Author information

Keywords: Polysilicon, Purity, Chlorosilane, CVD, Distillation, Semiconductor

JOURNAL FREE ACCESS

2007 Volume 123 Issue 12 Pages 704-706

DOI https://doi.org/10.2473/journalofmmij.123.704

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Abstract

Yokkaichi plant of Mitsubishi Materials Corporation was established in 1968. The products are high purity polycrystalline silicon (polysilicon) for use in semiconductors. The productivity expanded from 1.5t/M up to 1800t/Y in 40 years. Hydrogen reduction of trichlorosilane on heated silicon rod, commonly called "Siemens' process", had progressed at Yokkaichi plant. The outline of the process is described.