An Analysis of the Reflective Structures of Amorphous Silica in IR

Abstract

The reflective structures of the amorphous silica are examined from their temperature and angular dependent characteristics and also with a relation to the thermal radiation spectra. The reflective structures are analyzed as a photon scattering by a molecular unit localized at the top of the surface. Shift of the peak of the reflective structures with increasing temperature is interpreted as the temperature dependent perturbation from neighboring unit cells. An extrapolation of the frequency at the maximum reflectivity to 0, K gives the fundamental frequency of the vibrational mode.