Dependence of Plasma Profiles on ECH Power Absorption in Heliotron-E

Abstract

Dependence of plasma profiles on the power absorption of electron cyclotron heating is experimentally studied in the Heliotron-E helical device. A focused Gaussian beam with controllable polarization makes it possible to change the power absorption. The electron density and temperature profiles are sensitive to the single pass absorption rate. The electron temperature profile is peaked and the density profile is hollow as the single pass absorption increases. The resonance position is also important for determining their profiles. The electron temperature profile is changed from a peaked one to a hollow one, depending on the resonance position. The non-diffusive outward flow, which is necessary to form a hollow temperature profile, is estimated by using a simple heat transport model.