1961 Volume 16 Issue 4 Pages 792-793
Density (D)-Exposure (E) curves measured for Fuji Process Orthochromatic plates for electrons with energy 20∼200 kV were given. Dependence of developing conditions on D–E curves was also examined. At a suitable developing condition, D–E curves for electrons with higher energy than 50 kV are linear over a wide range of density, and for electrons with lower energy they bend over at lower density.
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