1978 Volume 44 Issue 6 Pages 1839-1849
The channel conductance and the Hall voltage in a wide and a long rectangular samples of n-type MOS inversion layers on Si(100) surfaces are measured in a strong magnetic field of 100 kOe at 1.6 K. A method of transformation from the conductance and the Hall voltage data to the transverse conductivity σxx and the Hall conductivity σxy in arbitrary magnetic field strength based on the Hall-effect field correction are described. The conductivity σxx and σxy are compared with σxx measured directly in a Corbino disk sample and σxy predicted by the quantum transport theory and the electron mobility data. Good agreement is obtained only in the wide sample by the use of a modified Hall-effect field correction. Effects of the electrode resistance, the side edges and the sample geometry are discussed in connection to the modification of the Hall-effect field correction.
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