Journal of the Physical Society of Japan
Online ISSN : 1347-4073
Print ISSN : 0031-9015
ISSN-L : 0031-9015
Structural Study of Amorphous Ge Using Extended X-Ray Absorption Fine Structure
Masatoshi WakagiMitsuo ChigasakiMasaharu Nomura
Author information
JOURNAL RESTRICTED ACCESS

1987 Volume 56 Issue 5 Pages 1765-1772

Details
Abstract
Extended X-ray absorption fine structure measurements were made on amorphous germanium, a-Ge, and hydrogenated amorphous germanium, a-Ge:H, both prepared at the substrate temperature of 50°C by sputtering. The first nearest neighbor distances of a-Ge and a-Ge:H are longer than that of crystalline germanium, c-Ge, by 0.016 Å and 0.011 Å, respectively. The Debye-Waller factor, Δσ, and the third moment of the first nearest neighbor distribution, ⟨Δr3⟩, were also determined. The relationships among the first nearest neighbor distance, Δσ and ⟨Δr3⟩ are in agreement with theoretical results derived from thermodynamics. These results suggest the existence of states corresponding to several hundred degrees quenched in a-Ge and a-Ge:H. Furthermore, the state of a-Ge is estimated to be about one hundred degrees higher than that of a-Ge:H.
Content from these authors

This article cannot obtain the latest cited-by information.

© THE PHYSICAL SOCIETY OF JAPAN
Previous article Next article
feedback
Top