Journal of the Physical Society of Japan
Online ISSN : 1347-4073
Print ISSN : 0031-9015
ISSN-L : 0031-9015
Electrical Resistivity in Oxide Semiconductor BaBi1−xMoxO3
Ikuyo ShiozakiHiroshi WatanabeAtsushi Hattori
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1992 Volume 61 Issue 2 Pages 679-683

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Abstract
Single crystals of BaBi1−xMoxO3 were grown with x up to 0.15. The electrical resistivity showed an activation type temperature dependence. The activation energy at room temperature increases from 0.1 to 0.24 (eV) with increasing x to 0.15. Near 0.05 of x transition from monoclinic to orthorhombic structures was observed. The corresponding change in the resistivity was observed in the range of 0.03<x<0.05. The activation energy increases when the crystal symmetry increases with increasing temperature, or with increasing molybdenum concentration. Such results rule out the picture of CDW-gap semiconductor. Instead we suggest the existence of localization gap at the Fermi surface, which comes from the disorder of Bi3+ and Bi5+, from impurities, or from oxygen vacancies.
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